eo_logo
  • Country/Region
  • cart   
 
See all 7 Products in Family

800nm, 0.80 NA, aplanoXX Aplan Objective | aplanoXX NA0.8_20_800

×
Stock #19-492 New
×
A$13,432.00
Qty 1+
A$13,432.00
Volume Pricing
Request Quote
Design Wavelength DWL (nm):
800
Wavelength Range (nm):
770 - 900
Numerical Aperture NA:
0.80
Type:
Objective
Clear Aperture CA (mm):
20
Diameter (mm):
44.00
Length (mm):
54.10
Model Number:
aplanoXX NA0.8_20_800
Damage Threshold, Pulsed:
100 mJ @ 5ns
300 μJ @ 1ps
Working Distance (mm):
2.5 (1.6 with Protective Window)
Focal Length FL (mm):
12.50
Mount:
C-Mount
Note:
Includes aplanoXX objective, mounted protective window (#19-496), and spanner wrench #19-497)
Focusing Depth (mm):
0 - 4
Beam Diameter (mm):
20 (maximum)
Field of View (°):
±0.3

Regulatory Compliance

RoHS:

Product Family Description

AdlOptica aplanoXX Aplan Objectives compensate for spherical aberration and coma when focusing into glass, sapphire, silicon carbide, silicon, PMMA, and other transparent materials at depths up to 4mm. These objectives are designed to be used with ultrafast solid-state and fiber lasers and are optimized for 800nm (Ti:sapphire) and 1030nm (Yb:doped). Featuring C-Mount threading and an optical design insensitive to misalignment, these objectives are easy to integrate into laser systems. AdlOptica aplanoXX Aplan Objectives are ideal for micromachining glass, 3D nanofabrication, waveguide recording, and selective laser etching. A collar on the objective allows for manual adjustment of focus and a replaceable front window protects from debris during materials processing.

×